Skip to main content

MAPEX Instrument Database

SEM

General information

Description
Scanning Electron Microscope
Manufacturer
Zeiss
Category
Surface Analytics
MAPEX Category
Surface / Interface Characterization, Dimensional Properties
Keywords
SEM, EDX, X-ray, REM, FIB, In-Lens
Measured Quantity
dimensions, surface morphologie, composition
Main Application
microscopy with up to nm resolution, material characterisation
Features
high resolution In-lens-detector, low kV ESB and high kV backscatter electron
Year of Fabrication
2012

Instrument specification

Specifications

Auriga 40 from Zeiss - FIBSEM - with energy dispersive X-ray spectroscopy (EDS) from Oxford - X-max 150, In-lens-detector for high resolution, energy selective backscatter electron (EsB)-detector for low kV-range, charge compensation (CC)

holders for 4 and 6 inch wafers, 9-stub-holder for 12,5 mm diameter pin stubs, holder for one dove tail stub

FIB

Contact

Contact person

Eva-Maria Meyer
Fachbereich 1
Fachbereich 1 Raum NW1 O 01120
Phone 0049-421-218-62617
emeyer@imsas.uni-bremen.de
http://www.imsas.uni-bremen.de/

Daniel Gräbner
Fachbereich 1
NW1 Raum O 1040
Phone 0049-421-218-62575
dgraebner@imsas.uni-bremen.de
http://www.imsas.uni-bremen.de/

Principal Investigator
Bergmann, Ralf
Lang, Walter
Updated by: MAPEX