Zum Hauptinhalt springen

MAPEX Instrument Database

FIB

General information

Description
Focused Ion Beam
Manufacturer
Zeiss
Location
--
OMOS NW1 O0150
Category
Electron Microscopy
MAPEX Category
Surface / Interface Characterization, Near- / Subsurface Properties, Dimensional Properties
Keywords
SEM, FIB
Measured Quantity
layer thickness; surface morphology
Main Application
Thickness measurement, material deposition, ion beam etching, e-beam lithography
Features
Gas injection system, e-beam writing system, energy selected backscattered electron detection
Year of Fabrication
2013

Instrument specification

Specifications

Contact

Contact person

Reiner Klattenhoff
BIAS
FZB HB 1080
Phone +49-421-218-58073
klattenhoff@bias.de
http://www.bias.de/industrie

Principal Investigator
Bergmann, Ralf
Aktualisiert von: MAPEX