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MAPEX Instrument Database

E-beam lithography

General information

Description
Elphy MultiBeam
Manufacturer
Raith
Category
---
MAPEX Category
Material Properties, Dimensional Properties, Surface / Interface Characterization
Keywords
Nanopatterning, Lithography, FIB, SEM, Material manipulation, Structure fabrication, Surface modification, Structure design
Main Application
FIB-SEM nanolithography and nanopatterning, SEM lithography, (3D) rapid nano prototyping
Features
Ion beam and electron beam milling, etching and deposition. 3D ion beam and electron beam lithography.
Year of Fabrication
2014

Instrument specification

Specifications

Contact

Contact person

Reiner Klattenhoff
-- / BIAS
FZB HB 1080
Phone +49-421-218-58073
klattenhoff@bias.de
www.bias.de

Principal Investigator
Bergmann, Ralf
Aktualisiert von: MAPEX