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MAPEX Instrument Database

3D Laser Lithography

General information

Description
Photonic Professional 3D Laser Lithography System
Manufacturer
Nanoscribe
Location
--
BIAS
Micro- and Nano-Optics LION
Category
---
MAPEX Category
Material Properties, Surface / Interface Characterization, Dimensional Properties
Keywords
3D laser lithography, Direct laser writing, Two-photon polymerization, Polymers, DOE, Material manipulation, Structure fabrication, Surface modification, 3D design
Main Application
Fabrication of 3D polymer-based structures like waveguides, DOE's, or photonic crystals.
Features
Objective 63x, NA = 1.4
Year of Fabrication
2010

Instrument specification

Specifications

Lateral feature size: < 200 nm (lateral linewidth in IP-L 780), Lateral resolution: < 500 nm, Axial resolution: 800 nm, Piezo range: 300 µm x 300 µm x 300 µm, Laser center wavelength: 780 nm.

Contact

Contact person

Claas Falldorf
-- / BIAS
falldorf@bias.de
www.bias.de

Principal Investigator
Bergmann, Ralf
Aktualisiert von: MAPEX