General information

• Investigation area

  Electron Microscopy
• Techniques

  Scanning Electron Microscopy
  
• Manufacturer

  Zeiss
• Fabrication year

  2013
• Measured quantity

  layer thickness; surface morphology
• Main application

  Thickness measurement, material deposition, ion beam etching, e-beam lithography

Instrument specification

Contact

• Application scientist

  Reiner Klattenhoff
  , BIAS
  FZB HB 1080
  Phone number +49-421-218-58073
  klattenhoffprotect me ?!biasprotect me ?!.de
• Principal investigator

  Bergmann, Ralf
  

Instrument location

• Group

  OMOS
• Building

  NW1
• Room

  O0150