Instrument Database



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General information

  • Techniques
    Thermal programmed desorption
    Photoemission spectroscopy
    Low-energy Electron Diffraction
  • Manufacturer
  • Fabrication year
  • Measured quantity
    Chemical composition of the (near) surface
  • Main application
    Chemical surface characterization of solid state materials
  • In-situ, real-time compatible
  • Correlated workflow available

Instrument specification

  • Technical aspects

    The UHV environment restricts the sample materials that can be analyzed, in particular no outgassing materials. The sample size can be up to 4 inches. To avoid charging of the specimen, a flood gun allows for analysis of insulating materials. For surface cleaning an Ar-sputter gun is attached. Due to a rotational arm, angle resolved measurements can be performed to determine the near surface depth dependend chemical composition. XPS analysis can be examined with a monocromatized Al (1486.7 eV) and Ag (2984.3 eV) anode. For UPS analysis, whether He I (21.2 eV)  or He II (48.4 eV) energy lines are used. In situ heating up to 800°C by electron impact heating is possible for samples up to 12 mm x 12 mm x 3 mm. Based on this, thermal programmed desorption (TPD) is possible using a HIDEN Massspectrometer (300 amu). An attached LEED module allows for additional in situ analysis of the surface crystallinity/arrangement.

  • In-situ capabilities
  • Correlated workflow
  • Additional measurement possibilities
    In situ heating up to 800°C. Thermally programmed desorption (TPD), low energy electron diffraction (LEED) attached via an UHV vaccuum line to an ALD and MBE system


Instrument location

  • Group
    AG Festkörpermaterialien
  • Building
  • Room
  • Faculty
    Fachbereich 1
  • Institute University
Updated by: MAPEX