Instrument Database

Surface Analytics

Photonic Professional 3D Laser Lithography System

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General information

  • Investigation area
  • Techniques
    3D Laser Lithography
  • Manufacturer
  • Fabrication year
  • Main application
    Fabrication of 3D polymer-based structures like waveguides, DOE's, or photonic crystals.

Instrument specification

  • Technical aspects

    Lateral feature size: < 200 nm (lateral linewidth in IP-L 780)

    Lateral resolution: < 500 nm

    Axial resolution: 800 nm

    Piezo range: 300 µm x 300 µm x 300 µm

    Laser center wavelength: 780 nm

  • Additional measurement possibilities
    3D laser lithography, direct laser writing, two-photon polymerization, polymers, DOE, material manipulation, structure fabrication, surface modification, 3D design


Instrument location

  • Group
    Micro- and Nano-Optics
  • Building
  • Institute
Updated by: MAPEX